Abstract
<jats:p>Pulsed laser deposition (PLD) has emerged as a versatile and powerful laser-based technique for the fabrication of high-quality thin films with precise control over composition, crystallinity, and nanostructure. This chapter presents a comprehensive overview of laser-based thin film fabrication via PLD, spanning fundamental laser–matter interactions, plasma plume dynamics, thin film growth mechanisms, and emerging application-driven material architectures. Particular emphasis is placed on the unique nonequilibrium nature of PLD, which enables the stabilization of metastable phases, stoichiometric transfer of complex materials, and tunable nanostructuring that are difficult to achieve using conventional deposition techniques. Beyond fundamental aspects, this chapter highlights recent advances in PLD-enabled functional thin films, including metal oxides, semiconductor heterostructures, plasmonic layers, and hybrid nanocomposites, with a focus on their applications in photonics, energy conversion, environmental remediation, and sensing technologies. Novel application paradigms are discussed, such as, wavelength-selective photofunctional coatings, plasmon-enhanced spectroscopic platforms, and laser-engineered interfaces for optoelectronic and catalytic devices. The integration of PLD with advanced strategies – such as controlled background atmospheres, multilayer engineering, and in situ diagnostics – demonstrates new pathways for tailoring thin film properties beyond equilibrium limits. By bridging fundamental plasma physics with application-oriented material design, this chapter provides new insights into PLD as a scalable and adaptable platform for next-generation thin film technologies. The presented perspectives underline the growing role of laser-based deposition not only as a fabrication tool but also as a materials engineering approach capable of addressing emerging challenges in sustainable energy, advanced sensing, and photonic device development.</jats:p>